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半導體設備陶瓷電漿溶射粉末

氧化釔粉

Plasma Sprayed Yttrium Oxide Powder
．Y₂O₃ / Y₂O₃ – ZrO₂
Excellent high-temperature safety and plasma corrosion resistance.
CVD is used for semiconductor and LCD equipment process components, extending their service life through plasma spray coating.
．YAG
It is amorphous and superior to crystalline materials, with excellent mechanical and chemical properties.
Suitable for semiconductor and LCD equipment process components and insulating spray coatings.
．Al₂O₃ (Crushing / Fracturing)
Mechanical strength, heat resistance, wear resistance, corrosion resistance
Excellent insulation properties in electrical, electronic, optical, mechanical, chemical, and other fields.
Widely used in semiconductor and LCD process ceramic materials.

德國製 SiC碳化矽晶錠全自動滾圓平邊研磨系統

SiC OD Grinder Q2

Logomatic GmbH designs and manufactures hard and brittle material crystal grinding systems

eSPC

SPC系列

A groundbreaking scale removal technology that offers a perfect solution for water conservation, energy efficiency, and chemical-free treatment. It aligns with the Carbon Neutrality 2050 policy and ESG management.

3D surface profile measurement equipment

GSS Plus

．Adopts non-contact measurement technology, without damaging the surface of the object.
．Combined with a high-precision motion control platform, customers can use point/line/area measurement methods for product 3D data analysis as needed.
．Measurement point distance (Resolution) and quantity can be programmatically controlled, without being limited by the hardware constraints of 3D surface scanning
．Applicable to a wide range of products, suitable for all products except for absorbent materials.

MPCVD

WEC-MP6000d

WEC-MP6000d is the most advanced CVD system capable of producing high-quality CVD diamonds for use in various industries
MPCVD (Microwave Plasma Chemical Vapor Deposition) Microwave Plasma Chemical Vapor Deposition method refers to high-purity hydrogen generating high-energy plasma fireballs under the action of powerful microwaves, and high-purity methane gas becomes free carbon atoms and hydrogen atoms under the action of plasma. Under the action of powerful energy plasma, these free carbon atoms will gradually deposit on the diamond seeds at the bottom in a three-dimensional arrangement, making the diamond seeds gradually grow thicker to form a CVD artificial diamond that is exactly the same as the "natural diamond structure & composition".

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