Process Materials

JIS240#~JIS6000#

Provide abrasives, grinding tools, abrasives and manufacture other borides, which are widely used in optoelectronics, machinery, electronics,
Instrumentation, chemical industry, metallurgy, national defense, aviation technology, nuclear industry, etc.

JIS240#-JIS6000#

Provide polishing of crystal and steel; precision polishing of ceramics and special steel; consolidated and abrasive-resistant tools, cutting, free grinding and polishing;
And it can manufacture advanced refractory materials, engineering ceramics, heating elements and thermal energy elements, etc.

SWC-2500、SWC-6000

For Wire Sawing and Diamond Wire Cutting Process, effectively extend the life time of diamond wire, and make simultaneous machining a plurality of crystal bar while maintaining performance

CORE            (Dia-Pen)

以鑽石劃線刀
將晶片表面上
劃線

CMP60~        CMP160等

Use of nanoscale abrasive particles and a special substrate preparation, a unique complex that tiny particles, low abrasive content of suspended excellent, high purity, fine grain size, no special cleaning process

可針對多樣化的拋光應用,並提供多樣性的表面選擇

Chemical mechanical polishing (CMP) using a variety of polishing applications for surface selection diversity (such as flat, lattice, etc.); with CMP polishing liquid, which allows machining surface roughness better meet the market demand for high standards

CB170、CB240、CB260      可客製化

The carrier for carrying the workpiece, the raw material is high-purity alumina sintered into flakes
Not easy to break, excellent flatness/planarity, surface roughness can be made according to customer requirements

PST-PCD60°           可客製化

Crafted from carefully selected diamonds for resurfacing polishing discs for smoothing and grooves